Why is Rotary Metal Sputtering Targets Better?

The sputtering target materials commonly found on the market can be divided into planar targets and rotatory targets according to their shapes. Want to know what are their advantages and disadvantages? Keep on reading this post.

Link to Acetron

Planar Sputtering Target

Although rotary targets have developed in recent years, the mainstream shape of the sputtering target is still the planar type.

Advantages

As for the planar target, its main advantages include simple structure, strong versatility, and good uniformity and repeatability of the film layer.

Simple structure – One of the main advantages of the planar target is its simple structure. Common shapes of planar targets on the market are rectangular and circular, which can be easily produced by molds. In other words, planar target preparation requires fewer machines and technologies and is easier to prepare. This is why planar targets still dominate the sputtering target market.

Low price – Price is always an important competitive factor. As mentioned above, the manufacturing process of the planar sputter target is easier, so its price is much lower than the rotatory sputter target.

Strong versatility – Planar sputtering targets usually have strong versatility. Therefore, the transportation process is relatively simple and the target materials are not easily damaged during transportation.

Good uniformity and repeatability – Film layers sputtered by planar targets usually boast good uniformity and repeatability. Planar targets are still best suited for prototype work or elemental experimentation, especially when large amounts of material are not needed at once.

Disadvantages

The biggest disadvantage of the planar target is the low utilization rate (generally only about 20%).  In the sputtering process of the planar target,  a strip-shaped pit will be formed when the target of the glow region (the magnetic field distribution region) is consumed to a certain extent, making the target body thinner. And once the pit depth reaches a certain value, the target cannot be utilized anymore. The low utilization rate also reduces its price advantage to some extent.

Rotatory Sputtering Target

Advantages

More surface area -Rotatory targets usually have more surface area per given length compared to planar targets. Therefore, the magnetron power can be spread out over a larger area in a given amount of time, which helps keep the target running cooler, decreases nodule formation, and reduces the occurrence of arcing.

Compact structure – Rotary sputtering decreases nodule formation, and targets can have longer continuous runtimes.

High utilization rate – The main advantage of the rotatory target over the planar target is the higher target utilization (generally about 80%).

Disadvantages

However, the rotatory target also has some unavoidable disadvantages in that there are many glow rings on the entire target surface during sputtering, so it cannot form a continuous strip glow.

Conclusion

The performance of different target shapes is related to specific preparation items and products, but we can come to a conclusion that rotary targets are more cost-effective for high-volume processes, while planar targets are still best suited for prototype work or elemental experimentation, especially when large amounts of material are not needed at once.

Ever wondered what makes semiconductor devices work like magic? Well, the answer lies in the thin films that coat them, and one of these processes is the rotary metal target. These cylindrical, rotating forms of metal (like tantalum, niobium, and molybdenum) are used in sputtering, a key process in semiconductor manufacturing. If you’re involved in purchasing for semiconductor production, this article is for you. Let’s break down why these metals are crucial and how to choose the right one for your needs.

What’s the Deal with Rotary Metal Targets?

In a nutshell, rotary metal targets are circular metal forms used in sputtering—a process where ions bombard a target material, ejecting particles that then deposit onto a substrate, creating a thin, functional film. The catch? The target rotates to ensure uniform wear and deposition. Pretty cool, right?

Now, why are materials like tantalum (Ta), niobium (Nb), and molybdenum (Mo) so special for these tasks? Let’s dive into it.

Tantalum

When you think of durability, tantalum is probably top of mind. Why? This metal’s a powerhouse—perfect for high-performance devices that require top-tier electrical conductivity, corrosion resistance, and thermal stability.

So, why use tantalum in semiconductor sputtering?

• Corrosion Resistance: Tantalum resists corrosion even in harsh environments. This makes it ideal for devices exposed to moisture and heat (think high-performance circuits).

• High Melting Point: With a melting point over 3,000°C, tantalum won’t break a sweat in high-energy sputtering environments.

• Great Electrical Conductivity: Essential for creating those thin films that make electronics work smoothly.

  For more information, please visit Rotary Metal Sputtering Targets.

So, if you’re looking for a reliable, durable thin film, tantalum’s your guy.

Niobium

Niobium is a bit of a secret weapon in semiconductor sputtering. Why? Because it has superconducting properties and can withstand extreme temperatures—perfect for specialized applications like quantum computing.

What makes niobium stand out?

• Superconductivity: Niobium is essential for devices where superconductivity matters. This is a must for next-gen tech like quantum computers.

• Strength in Cold: It’s strong even at ultra-low temperatures, which is crucial for technologies used in cryogenic environments.

• Excellent Bonding: Niobium forms strong bonds with other materials, helping to produce durable and reliable thin films.

So, if you’re working with cutting-edge quantum or cryogenic tech, niobium will be your go-to.

Molybdenum

Molybdenum is the Swiss army knife of metals—it’s versatile, reliable, and performs well in high-stress environments. Whether you’re dealing with high temperatures, electrical conductivity, or thermal stability, molybdenum is a safe bet.

Why choose molybdenum for sputtering?

• Thermal Stability: It’s got amazing thermal conductivity, which is perfect for high-temperature semiconductor applications.

• Electrical Conductivity: Molybdenum is great at conducting electricity, so it’s ideal for making thin films that need consistent electrical performance.

• Wear Resistance: It’s built to last—molybdenum resists wear, so your rotary targets last longer, saving you costs in the long run.

Need a metal that’s reliable, tough, and doesn’t quit? Molybdenum’s got you covered.

How to Choose the Right Rotary Metal Target?

Choosing the right rotary metal target isn’t as simple as picking the first one you see. Here are a few things to keep in mind:

1. Material Composition: Is purity important? The composition of the target material affects film quality and performance.

2. Deposition Requirements: Are you after high deposition rates or super-thin films? Different targets work better for specific deposition needs.

3. Compatibility: Make sure your target material is compatible with the process gases (like argon or oxygen) and substrate materials (like silicon).

4. Temperature Tolerance: Check that the target can handle the temperatures expected during sputtering. You don’t want your target to degrade prematurely.

5. Cost vs. Performance: Yes, budget matters. But it’s essential to balance cost with performance. Sometimes, spending a little more up front can save you big-time down the road.

Conclusion

Tantalum, niobium, and molybdenum are the stars of the rotary metal target world, each bringing something unique to the sputtering table. Whether you need high durability, superconductivity, or thermal stability, these metals have got your back. When selecting a rotary metal target for semiconductor applications, keep in mind the key factors that can make or break your process, from material composition to temperature tolerance.

If you are looking for more details, kindly visit planar sputtering targets.